Oxford Instruments releases HVPE reactor
Oxford Instruments Plasma Technology
HVPE reactor
Oxford Instruments has launched Crystalflex, a multi-wafer hydride vapour-phase epitaxy (HVPE) reactor.
It provides epitaxial growth control and a cost-effective route for the production of high-quality, crack-free epitaxial GaN, AlGaN and AlN single-crystal materials.
The equipment is designed for research and development (RandD) or full-scale production of Group III nitrides, with the focus on process stability, reproducibility, and optimal source materials use.
The flexible reactor configuration enables end users to grow a variety of Group III nitrides with various thicknesses.
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